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AlN Template on Sapphire(0001) 2"x 0.5mm, one sides polished ,AlN film: 5000nm - FmAlNonALc50D05C1FT5000US5

AlN Template on Sapphire(0001) 2"x 0.5mm, one sides polished ,AlN film: 5000nm - FmAlNonALc50D05C1FT5000US5

AlN  Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.  AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Sizes                                                       2” Round 
  •  Dimensions:                                             50mm +/- 2mm
  •  Substrate Sapphire Orientation:               c-axis (0001) +/- 1.0deg.
  • Type and Doping:                                  Undoped, Semi-insulating
  • Macro Defect Density:                                <5 cm-2
  • Front Surface Finish (Al Face):                     As-grown
  • Back Surface Finish Sapphire                       as-received finish
  •  Useable Surface Area                                >90% 
  •  Edge Exclusion Area                                  1mm
  •   Package                                                  Single Wafer Container
  • AlN layer thickness                                      5000 nm  , (¡À 10%) 

 

 

 

 Related data

For Surface Rughness and XRD data, Please click here.

  •   AlN MSDS
  •  

 

Related Products

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater

$836.50

Original: $2,390.00

-65%
AlN Template on Sapphire(0001) 2"x 0.5mm, one sides polished ,AlN film: 5000nm - FmAlNonALc50D05C1FT5000US5

$2,390.00

$836.50

Product Information

Shipping & Returns

Description

AlN  Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.  AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Sizes                                                       2” Round 
  •  Dimensions:                                             50mm +/- 2mm
  •  Substrate Sapphire Orientation:               c-axis (0001) +/- 1.0deg.
  • Type and Doping:                                  Undoped, Semi-insulating
  • Macro Defect Density:                                <5 cm-2
  • Front Surface Finish (Al Face):                     As-grown
  • Back Surface Finish Sapphire                       as-received finish
  •  Useable Surface Area                                >90% 
  •  Edge Exclusion Area                                  1mm
  •   Package                                                  Single Wafer Container
  • AlN layer thickness                                      5000 nm  , (¡À 10%) 

 

 

 

 Related data

For Surface Rughness and XRD data, Please click here.

  •   AlN MSDS
  •  

 

Related Products

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater

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