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Atmospheric Plasma Beam with Automatic Scanning System for Surface Treatment- GSL1100X-PJF-A

Atmospheric Plasma Beam with Automatic Scanning System for Surface Treatment- GSL1100X-PJF-A

GSL1100X-PJF-A combines atmospheric plasma beam together with two dimensions automatic working stage, which allows the plasma beam to scan sample surface according to program setting and surface coating or treatment consistent and uniform. The system consists of an RF generator, flexible gas delivery pipe, plasma beam head, the X-Y working stage with vacuum chuck sample holder, and programmable control box. The plasma beam can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics, etc, and also it can make plasma-enhanced CVD film on the substrate via mixture chemical gas under atmospheric pressure.


SPECIFICATIONS

Input Power for Plasma 208 V - 240VAC, 50/60 Hz, < 1000W
RF Generator 
 Output Frequency: 20-23 kHz, 25KV  (click picture below - left to see detail specs)
Plasma Beam Head: Roundhead: 10-12mm
     
Input Gas Pressure and Working Gases
  • 40 PSI min.(0.055 Mpa)
  • Air, N2, Ar, He or any mixed gas (no flammable and explosive gases)
Plasma Working Pressure 7- 10 PSI

Working Environmental
  • Temperature: < 42°C
  •  Humidity: ≤ 40% RH
  •  No flammable gas

Sample Stage & Controller
  • X-Y two dimensions are driven by step motors and controlled by the SBC control box.
  • Z-axis is adjustable by manual
  • The control box has an LCD display and the scanning program can be set by the function key
  • Max. scanning area: 8" x 9"
  • One 4" diameter vacuum chunk is installed on X-Y sample holder, which can soak thin wafer up to 6" diameter on the sample holder firmly
  • One vacuum pump is included to connect the vacuum chunk
  • The whole system is placed on a heavy-duty mobile cart  (600x600x 800Lmm)
  • Optional:  Heating plate up to 500°C can be installed on the movement stage with manufacture modification (available upon request at extra cost). also, it can be placed inside glovebox to operate under inner gas atmosphere or inside a fume hood for harmful gases (see pictures below-right)
                   

Dimensions & Net Weight
  • Coating Stage Dimensions: 560mm L x 483mm W x  x 609mm H (Supporting Frame Dimensions: 420mm L x 305mm W x 457mm H)
  • Plasma Generator Dimensions: 406mm L x 508mm W x 230mm H
  • Movement Control Box Dimensions: 330mm L x 305mm W x 152mm H
  • Net weight: 55 kg

Warranty & Certificate
  • One year limited warranty with lifetime support
  • CE certified




Operation Instructions
    
Application Notes

Please click the link to learn more about AP-PECVD application: Atmospheric-Pressure Plasma-Enhanced Chemical Vapour Deposition (AP-PE-CVD) For Growth Of Thin Films At Low Temperature.
Option Part
  • Blue Adhesive Plastic Film (PVC) for Vacuum Chuck, EQ-ECO-519-LD
$10,146.15

Original: $28,989.00

-65%
Atmospheric Plasma Beam with Automatic Scanning System for Surface Treatment- GSL1100X-PJF-A—

$28,989.00

$10,146.15

Product Information

Shipping & Returns

Description

GSL1100X-PJF-A combines atmospheric plasma beam together with two dimensions automatic working stage, which allows the plasma beam to scan sample surface according to program setting and surface coating or treatment consistent and uniform. The system consists of an RF generator, flexible gas delivery pipe, plasma beam head, the X-Y working stage with vacuum chuck sample holder, and programmable control box. The plasma beam can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics, etc, and also it can make plasma-enhanced CVD film on the substrate via mixture chemical gas under atmospheric pressure.


SPECIFICATIONS

Input Power for Plasma 208 V - 240VAC, 50/60 Hz, < 1000W
RF Generator 
 Output Frequency: 20-23 kHz, 25KV  (click picture below - left to see detail specs)
Plasma Beam Head: Roundhead: 10-12mm
     
Input Gas Pressure and Working Gases
  • 40 PSI min.(0.055 Mpa)
  • Air, N2, Ar, He or any mixed gas (no flammable and explosive gases)
Plasma Working Pressure 7- 10 PSI

Working Environmental
  • Temperature: < 42°C
  •  Humidity: ≤ 40% RH
  •  No flammable gas

Sample Stage & Controller
  • X-Y two dimensions are driven by step motors and controlled by the SBC control box.
  • Z-axis is adjustable by manual
  • The control box has an LCD display and the scanning program can be set by the function key
  • Max. scanning area: 8" x 9"
  • One 4" diameter vacuum chunk is installed on X-Y sample holder, which can soak thin wafer up to 6" diameter on the sample holder firmly
  • One vacuum pump is included to connect the vacuum chunk
  • The whole system is placed on a heavy-duty mobile cart  (600x600x 800Lmm)
  • Optional:  Heating plate up to 500°C can be installed on the movement stage with manufacture modification (available upon request at extra cost). also, it can be placed inside glovebox to operate under inner gas atmosphere or inside a fume hood for harmful gases (see pictures below-right)
                   

Dimensions & Net Weight
  • Coating Stage Dimensions: 560mm L x 483mm W x  x 609mm H (Supporting Frame Dimensions: 420mm L x 305mm W x 457mm H)
  • Plasma Generator Dimensions: 406mm L x 508mm W x 230mm H
  • Movement Control Box Dimensions: 330mm L x 305mm W x 152mm H
  • Net weight: 55 kg

Warranty & Certificate
  • One year limited warranty with lifetime support
  • CE certified




Operation Instructions
    
Application Notes

Please click the link to learn more about AP-PECVD application: Atmospheric-Pressure Plasma-Enhanced Chemical Vapour Deposition (AP-PE-CVD) For Growth Of Thin Films At Low Temperature.
Option Part
  • Blue Adhesive Plastic Film (PVC) for Vacuum Chuck, EQ-ECO-519-LD

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